Nanotechnologie

What it is about

You will learn fundamental methods of nanofabrication (e.g., optical lithography, electron-beam lithography, FIB) as well as newer techniques (e.g., X-ray lithography, nanoimprint). In addition you will cover bottom-up growth methods for semiconductor nanostructures (e.g., MOCVD, MBE) and methods for nano-analytical characterization (e.g., electron microscopy, X-ray methods, atom probe tomography). In the end you will be able to assess fabrication methods and analysis techniques and estimate their interplay with structural and electronic properties for technological applications.

What you will be able to do

• Basic knowledge in nanofabrication and analysis of semiconductor-based devices
• Selection and evaluation of suitable nanotechnological fabrication techniques
• Investigation of the limits of different methods
• Structural, atomic and surface-specific analysis of nanostructured materials
• Understanding the relation between material production, structure/electronic properties and functionality

What the module consists of

• VorlesungPresentation of thematic content, examples and discussion to convey the basics
• ÜbungIndependent solving of tasks, processing and discussion with scientific supervision

Teaching method

• Vortrag/PräsentationStructured conveyance of teaching content and stimulation for substantive engagement
• DiskussionDeepening through exchange and critical reflection of the examples
• Aufgabenblätter und ÜbungsbesprechungIndependent application, control and deepening of the learned methods
• LaborbesichtigungIllustrative supplement by insights into real facilities and processes